Ltd Ret Software Research Engineer/scientist

Intel Intel · Semiconductors · Oregon, Hillsboro, United States

Research Engineer/Scientist in Intel's Logic Technology Development (LTD) RET team, focusing on computational lithography and resolution enhancement techniques for semiconductor manufacturing. The role involves using predictive modeling, statistics, machine learning, and data analysis to develop software algorithms and compensate for physical effects in photolithography imaging and etch pattern transfer. Requires PhD or Master's with extensive experience in semiconductor industry, computational lithography, and OPC concepts.

What you'd actually do

  1. Optical Proximity Correction (OPC) simulations
  2. Research, development, and implementation of Resolution Enhancement Techniques (RET) for existing and novel process technologies
  3. Defines and selects new approaches and implementation of RET
  4. Maintains substantial knowledge of the state-of-the-art principles and theories in lithography, optics, photoresists, computer modeling, and software engineering
  5. Use predictive modeling, statistics, machine learning, and other data analysis techniques to collect, explore, visualize fab process data, and develop RET software algorithms and applications to compensate for physical effects in photolithography imaging and the etch pattern transfer process

Skills

Required

  • PhD in Engineering, Physics, Physical Science, or related fields with 4+ years of experience in the semiconductor industry OR Master’s degree in Engineering, Physics, Physical Science, or related fields with 6+ years of experience in the semiconductor industry OR Bachelor’s degree in Engineering, Physics, Physical Science, or related fields with 9+ years of experience in the semiconductor industry
  • Computational lithography
  • Resolution enhancement technology
  • Mask optimization capability
  • OPC concepts and capabilities

Nice to have

  • Understanding of the latest techniques for developing and optimizing OPC solutions to support both high volume and newly developing technology nodes

What the JD emphasized

  • Emphasis on computational lithography, resolution enhancement technology, or mask optimization capability
  • Extensive knowledge of OPC concepts and capabilities

Other signals

  • computational lithography
  • resolution enhancement techniques
  • machine learning for process optimization